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2.4 ZnO掺杂透明导电氧化物沉积透明导电氧化物薄膜,例如SnO2、ITO、ZnO,有很多应用,如建筑玻璃、汽车、显示器、光伏器件。制备掺杂氧化锌膜用射频或脉冲直流溅射陶瓷靶,它含有ZnO和2%(重量比)Al2O3,无论如何靶的代价是过高的,而能用的功率密度是有限的。最近反应磁控溅射Zn:Al靶受到关注,虽然它需电压控制和氧分压强的闭环控制以保证工作在金属/氧化物过渡模式。
2.4 ZnO doped transparent conductive oxide Transparent conductive oxide film deposition, such as SnO2, ITO, ZnO, there are many applications, such as architectural glass, automotive, displays, photovoltaic devices. Preparation of Doped Zinc Oxide Films RF or pulsed direct-flow sputtered ceramic targets containing ZnO and 2% (weight ratio) Al 2 O 3 are used, however, the target is too expensive and the usable power density is limited. Recent reactive magnetron sputtering of Zn: Al targets is of concern, although it requires voltage control and closed-loop oxygen partial pressure control to work in the metal / oxide transition mode.