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利用直流磁控反应溅射技术,通过调节反应气压(RP),在250℃衬底温度下制备了一系列氧化银(AgxO)薄膜,并利用X射线衍射谱、能量色散谱和分光光度计重点研究了RP对AgxO薄膜的结构和光学性质的影响.研究结果表明,随着RP从0.5Pa升高到3.5Pa,薄膜明显呈现了从两相(AgO+Ag2O)到单相(Ag2O)结构再到两相(Ag2O+AgO)结构的演变.特别是在RP=2.5Pa时成功制备了单相Ag2O薄膜,使AgxO薄膜的热分解临界温度的有效降低成为现实.AgxO薄膜透明区的透射率随RP的增加而增加,而反射率和吸收率随RP的增加而减小.该结果可归结于薄膜相结构的演变和薄膜厚度的减小.两相(AgO+Ag2O)薄膜的吸收边在2.75eV附近,而单相(Ag2O)和Ag2O相占主导的两相(Ag2O+AgO)薄膜的吸收边在2.5eV附近.
A series of silver oxide (AgxO) thin films were prepared by direct current magnetron reactive sputtering at a substrate temperature of 250 ℃ by adjusting the reaction pressure (RP). X-ray diffraction, energy dispersive spectroscopy and spectrophotometer The effects of RP on the structure and optical properties of AgxO thin films were investigated. The results show that the films show a phase transition from AgO + Ag2O to Ag2O with increasing RP from 0.5Pa to 3.5Pa. (Ag2O + AgO) structure evolution, especially at RP = 2.5Pa single-phase Ag2O film was successfully prepared, AgxO thin film thermal decomposition of the critical temperature of the effective reduction of the real.AgxO film transparent region with the transmittance RP increased with the increase of RP.The results were attributed to the evolution of the phase structure and the decrease of the film thickness.The absorption edge of the two-phase (AgO + Ag2O) film was observed at 2.75 eV, whereas the absorption edge of the two-phase (Ag2O + AgO) film dominated by Ag2O and Ag2O is around 2.5eV.