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用低频扭摆测量了掺氧的超纯Ta的Snoek-Kstcr弛豫.观察到了四种不同类型的S-K弛豫过程.在氧含量较低因而位错具有非饱和的填隙原子气团的条件下出现“SK-1”和“SK-2”弛豫.在氧含量较高的饱和气团条件下出现“SK-4”弛豫,而“SK-5”也属于非饱和气团的条件.本文还观测到随退火温度的提高和氧含量的增加,出现SK-5弛豫的试样有逐渐向sK-4弛豫过渡的趋势.除了SK-1弛豫对退火较不稳定以外,其它弛豫过程均较为稳定.比较了前人的测量结果与本文的实验数据.表明文献报道的Ta的S-K弛豫分别属于本文的不同类型的S-K弛豫.
The Snoek-Kstcr relaxation of the oxygen-doped ultrapure Ta was measured with low-frequency torsion. Four different types of SK relaxation processes were observed. Under the conditions of low oxygen content and thus dislocations with unsaturated interstitial atomic air masses “SK-1” and “SK-2” relaxation occur under the condition of “SK-4” relaxation under the condition of saturated oxygen with higher oxygen content and “SK-5” It is also observed that with the increase of annealing temperature and the increase of oxygen content, the sample with SK-5 relaxation tends to gradually transition to sK-4 relaxation. Except for the SK-1 relaxation, the relaxation is not stable and the relaxation The results show that the SK relaxation in Ta reported in the literature belongs to the different types of SK relaxation in this paper.