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概述 红外光刻机是一种特殊用途的光刻机,其特点是通过红外显微镜来观察样片反面图形,从而可以样片反面与掩膜套刻,即实现背面光刻工艺。利用这种工艺可提高器件的性能,如FET器件的源区面接地工艺,减少了器件的源区电感值,使器件增益提高,红外光刻机广泛用于砷化镓、锢砷磷,硅等材料光刻,是生产微波FET器件,光电器件和其它器件的重要工艺设备。JB5型红外光刻机的电控系统包括红外显微镜高压聚焦电路、红外光源电路、主控回路、高精度数显计时器及曝光光源的恒光强控制电路等。 红外显微镜成象原理及其高压聚焦与光源电路
Overview Infrared lithography machine is a special purpose lithography machine, which is characterized by the infrared microscope to observe the sample reverse pattern, which can reverse the sample and the mask overlay, that is, the back of the lithography process. The use of this process can improve the performance of the device, such as FET devices, the source area surface grounding technology to reduce the source inductance of the device, the device gain increased, infrared lithography is widely used in gallium arsenide, implants arsenic phosphorus, silicon And other materials lithography, is the production of microwave FET devices, optoelectronic devices and other important device technology devices. JB5-type infrared lithography electronic control system, including infrared microscope high-pressure focusing circuit, infrared light source circuit, the main control circuit, high-precision digital timer and exposure light constant light control circuit. Infrared microscope imaging principle and its high voltage focusing and light source circuit