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本文用溶胶-凝胶技术，以无机盐氧氯化锆（ZrOCl2·8H2O）为前驱体，在不锈钢表面上制备了含SiO2相的ZrO2缓冲膜，并用真空蒸镀法在其上沉积一层厚度为150nm的金膜．通过XRD、FTIR、SEM及AES等测试手段对ZrO2缓冲膜的性能及其热处理过程中的物理化学变化进行了表征.结果表明；不锈钢箔基体上的四方ZrO2膜在（200）晶面上有择优取向的特点，缓冲膜与基体之间存在着一定程度的互扩散作用．同时，法向热发射率的测试结果表明，850℃热处理后材料仍能保持极低的热发射率（ε=0．043），说明缓冲膜有效地阻挡了金膜与基体之间的高温互扩散作用．
In this paper, a ZrO2 buffer film with SiO2 phase was prepared on the surface of stainless steel by sol-gel technique using inorganic zirconium oxychloride (ZrOCl2.8H2O) as a precursor, and vacuum deposition was used to deposit a layer of thickness A gold film of 150 nm. The properties of ZrO2 buffer films and their physico-chemical changes during the heat treatment were characterized by XRD, FTIR, SEM and AES. The results show that the tetragonal ZrO2 film on the stainless steel foil substrate has the (200) crystal plane selectivity Orientation of the characteristics of the buffer film and the matrix there is a degree of mutual diffusion effect. At the same time, the test results of normal thermal emissivity show that the material can still maintain a very low thermal emissivity (ε = 0.043) after heat treatment at 850 ℃, indicating that the buffer film effectively blocks the high temperature interaction between the gold film and the substrate Diffusion.