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Diamond thin films were prepared in a modified quartz bell-jar type microwave chemical vapor deposition (MWPCVD) system. The influences of process parameters on MWPCVD diamond thin films quality such as substrate pretreatment, deposition gas ratio, deposition pressure and substrate position were examined and studied. The deposited films were characterized by using Scanning electron microscopy(SEM) and Raman spectroscopy. It was shown that this quartz bell-jar type MWPCVD system is beneficial to the deposition of high quality diamond thin films.
The influences of process parameters on MWPCVD diamond thin films quality such as substrate pretreatment, deposition gas ratio, deposition pressure and substrate position were examined and The deposited films were characterized by using Scanning electron microscopy (SEM) and Raman spectroscopy. It was shown that this quartz bell-jar type MWPCVD system is beneficial to the deposition of high quality diamond thin films.