论文部分内容阅读
通过非平衡磁控溅射的方法制备了不同V含量的(Zr,V)N复合薄膜,采用EDS,XRD,XPS,纳米压痕仪和摩擦磨损仪等对薄膜的化学成分、微结构、力学性能及摩擦性能进行了研究.结果表明,V的加入虽未改变ZrN的fcc晶体结构,但使薄膜的择优取向由ZrN的(200)面转变为(Zr,V)N的(111)面.随着V含量增加,(Zr,V)N复合膜的硬度略有升高后缓慢降低,并在含25.8at.%V后迅速降低.与此同时,薄膜的常温摩擦系数亦有小幅降低.高温摩擦研究表明,(Zr,V)N薄膜在300℃时出现V2O3,V2O5在500℃后形成,其含量也随温度的提高而增加.薄膜的摩擦系数因V2O5的形成而得到显著降低.
(Zr, V) N composite films with different content of V were prepared by unbalanced magnetron sputtering. The chemical composition, microstructure, mechanical properties and mechanical properties of the films were investigated by EDS, XRD, XPS, Properties and tribological properties of ZrN films have been studied.The results show that although the addition of V does not change the fcc crystal structure of ZrN, the preferred orientation of the films is changed from the (200) plane of ZrN to the (111) plane of (Zr, V) N. With the increase of V content, the hardness of (Zr, V) N composite films decreased slightly and then decreased rapidly after containing 25.8at.% V. At the same time, the friction coefficient of films at room temperature also decreased slightly. The results of high temperature friction show that V2O3 is formed at 300 ℃ and V2O5 is formed at 500 ℃, and the content of V2O5 also increases with the increase of temperature.The friction coefficient of the film decreases remarkably due to the formation of V2O5.