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聚变实验装置的真空室壁上吸附的杂质可以使用放电清洗的方法去除。在MPT—X托卡马克上,我们在纵场线圈中通电产生磁场,由窗口注入微波(2450MHz),电子迴旋频率与微波频率相同时,产生共振吸收,从而得到高密度,低温等离子体。等离子体和壁之间的相互作用,使碳、氧等杂质形成碳氢化合物,水或碳的氧化物而被解吸,被抽气泵抽除。研究了等离子体的密度,温度与微波功率、共振面位置、运行气压的关系;研究了聚变实验装置真空室器壁吸附的主要杂质CH_4、CO,特别是H_2O,在不同等离子体条件下的解吸关系;发现存在着最佳运行气压,这个运行气压与该等离子体温度有关;对于清除主要杂质H_2O的最佳等离子体温度相当5eV。利用一个简单模型,分析了等离子体密度和温度对杂质,特别是H_2O的解吸及去除的关系,并且解释了实验结果。
The impurities adsorbed on the walls of the vacuum chamber of the fusion experiment apparatus can be removed by using a discharge cleaning method. On the MPT-X tokamak, we energize the longitudinal field coil to generate a magnetic field. The microwave is injected into the window (2450MHz). When the electron cyclotron frequency is the same as the microwave frequency, resonance absorption occurs, resulting in a high-density, low-temperature plasma. The interaction between the plasma and the wall causes carbon, oxygen and other impurities to form hydrocarbons, water or carbon oxides desorbed by pump suction pump. The relationship between plasma density, temperature and microwave power, resonant surface position and operating pressure was studied. The main impurities CH_4, CO, especially H_2O, adsorbed on the wall of the vacuum chamber were studied. The desorption under different plasma conditions Relationship; found that there is the best operating pressure, the operating pressure is related to the plasma temperature; for the removal of H 2 O the most appropriate plasma temperature is quite 5eV. Using a simple model, the relationship between plasma density and temperature on desorption and removal of impurities, especially H 2 O, was analyzed and the experimental results were explained.