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使用热蒸发技术在锗(111)衬底上制备了氟化铒(ErF3)薄膜.XRD衍射结果表明,随着衬底温度的增加,氟化铒薄膜发生了从非晶状态到结晶状态的转变,薄膜的表面形貌和红外光学性能也发生了显著的变化,部分结晶的氟化铒薄膜的远红外透射谱和完全非晶的薄膜基本一致,但是与结晶薄膜则没有相似之处.晶格常数计算表明薄膜中存在压应力.使用洛伦兹谐振子模型对薄膜的透射率曲线进行拟合计算,得到ErF3薄膜的折射率和消光系数.在10μm处非晶薄膜的折射率和消光系数最小值分别为1.38和0.01,结晶薄膜的折射率和消光系数最小值分别为1.32和0.006.
The erbium fluoride (ErF3) thin films were prepared on germanium (111) substrate by thermal evaporation technique.The results of XRD showed that as the substrate temperature increased, the ErF3 thin films changed from amorphous state to crystalline state , The surface morphology and infrared optical properties of the films also changed significantly. The far-infrared transmission spectrum of the partially crystallized erbium fluoride thin films was basically the same as that of the completely amorphous films, but no similarities with the crystalline films. The constant calculation shows that there is compressive stress in the film.The refractive index and extinction coefficient of ErF3 film are calculated by fitting the transmittance curve of Lorentz oscillator model.The refractive index and extinction coefficient of the amorphous film at 10μm are the smallest Values of 1.38 and 0.01, respectively. The minimum values of refractive index and extinction coefficient of crystalline films were 1.32 and 0.006, respectively.