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Soltec公司和日立制作所,最近利用等倍接近曝光方式的SOR光刻技术成功地复制0.1μm图形。在确认此项开发技术有效性的同时,证实了具有4Gbit—DRAM级的分辨率。
Soltec Corp. and Hitachi, Ltd. recently succeeded in copying 0.1 μm patterns using SOR lithography techniques such as equal-proximity approach. In confirming the effectiveness of this development technology, confirmed with 4Gbit-DRAM level resolution.