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离子镀氮化钛(TiN)膜的应力状态和膜/基之间界面结构直接影响到涂层与基材的附着性。为了弄清涂层内部应力及界面结构对膜/基附着性的影响机理,人们对涂层自身应力和膜/基界面进行了一些相关的研究工作。我们通过添加钇离子镀TiN膜,借助钇的界面富集和改性作用,极大改善了TiN膜与基材的附着性。本文采用X射线线形分析法和透射电子显微镜(TEM)分析术,研究钇改性前后TiN膜内部微观应力和钇改性TiN膜[以Ti(Y)N表示]与A3钢基材界面的微观结构,从而探讨了涂层内部的微观应力和膜/基界面结构对其附着性的影响机理。
The stress state of ion-plating titanium nitride (TiN) film and the interfacial structure between the film / substrate directly affect the adhesion of the coating to the substrate. In order to find out the mechanism of the influence of internal stress and interfacial structure on the adhesion of the film / substrate, some related researches have been done on the self-stress and the film / substrate interface. By adding yttrium ion plating TiN film, with yttrium interface enrichment and modification, greatly improved the TiN film and the substrate adhesion. In this paper, the micro-stress of TiN film and the microstructure of yttrium-modified TiN film [expressed as Ti (Y) N] and A3 steel substrate before and after yttrium modification were studied by X-ray linear analysis and transmission electron microscopy (TEM) Structure, so as to discuss the micro-stress inside the coating and the influence mechanism of film / base interface structure on its adhesion.