【摘 要】
:
In this study, the emission spectra of active atoms O (3p5P → 3s5S20 777.4 nm),Ha (3P → 2S 656.3 nm) and N (3p4P → 3s4S0 742.3 nm, 744.2 nm, 746.8 nm) produc
【机 构】
:
State Key Laboratory of Materials Modification by Laser
【基金项目】
:
The project of the United Fund of the National Natural Science Foundation of China and the Engineering PhysicsInstitute of China;the funding of Liaoning Province Natural Science Foundation
论文部分内容阅读
In this study, the emission spectra of active atoms O (3p5P → 3s5S20 777.4 nm),Ha (3P → 2S 656.3 nm) and N (3p4P → 3s4S0 742.3 nm, 744.2 nm, 746.8 nm) produced by thepositive high-voltage pulsed corona discharge (HVPCD) of N2 and H2O mixture in a needle-platereactor have successfully been recorded against a severe electromagnetic interference coming fromthe HVPCD at one atmosphere. The effects of the peak voltage, the repetition rate of pulseddischarge and the flow rate of oxygen on the production of those active atoms are investigated. Itis found that when the peak voltage and the repetition rate of the pulsed discharge are increased,the emission intensities of those active atoms rise correspondingly. And the emission intensities ofO (3p5P → 3s5S20 777.4 nm), Ha (3P → 2S 656.3 nm) and N (3p4P → 3s4S0 742.3 nm, 744.2 nm,746.8 nm) increase with the flow rate of oxygen (from 0 to 25 ml/min) and achieve a maximumvalue at a flow rate of 25 ml/min. When the flow rate of oxygen is increased further, the emissionintensities of those atoms visibly decrease correspondingly. The main physicochemical processesof interaction involved between electrons, neutrals and ions are also discussed.
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