论文部分内容阅读
准分子激光退火是一种可以将非晶体硅（a－silicon）转变为多晶硅（resilicon）的处理方法．由于它允许对玻璃基底上的硅薄膜低温处理，代替了需要热退火处理的昂贵石英基底，因此对于平板显示工业来讲，这种处理方法日益显得重要。采用对非晶体硅进行单点激光退火可以得到小的
Excimer Laser Annealing is a processing method that can convert a-silicon into a resilicon. This approach is increasingly important to the flat panel display industry as it allows for the cryogenic treatment of silicon films on glass substrates instead of the expensive quartz substrates that require thermal annealing. Using a single-point laser annealing of amorphous silicon can be small