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介绍了真空镀膜设备中高压离子轰击源的电路构成以及在“离子清洗”工艺过程和“离子聚合”工艺过程的工作原理，同时论述了对于过流现象所采取的一些软、硬件保护措施．
The circuit structure of high pressure ion bombardment source in vacuum coating equipment and the working principle in “ion cleaning” process and “ion polymerization” process are introduced. Some soft and hardware protection measures for overcurrent phenomenon are also discussed.