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高T_c超导材料的实用化和超导电子学的进展,在很大程度上取决于超导薄膜技术的突破,因此国内外正广泛而深入地开展薄膜生长方法、薄膜结构和特性的研究。华中理工大学光学系薄膜实验室和激光技术国家重点实验室利用射频溅射技术、电子束蒸发技术和激光蒸发技术分别在ZrO_2和SrTiO_3等衬底上制备Y-Ba-Cu-O薄膜获初步成果。 测试数据表明:利用三种方法制备的薄膜其零电阻温度均在85K以上,其中最好的结果是用射频溅射法在ZrO_2衬底上制得的,开始转变温度为99K,零电阻温度90K,宽度为2K,电流密度在78K下测量为10~3—10~4A/cm~2。经X线衍射、扫描电镜和透射电镜等
The practical application of high-T superconducting materials and the progress of superconducting electronics depend largely on the breakthrough of superconducting thin films. Therefore, the research on thin-film growth methods, thin-film structures and properties is extensively and deeply carried out at home and abroad. Y-Ba-Cu-O thin films were prepared on ZrO_2 and SrTiO_3 substrates by radio frequency sputtering, electron beam evaporation and laser evaporation, respectively, according to the preliminary results obtained from the Thin Film Lab and the State Key Laboratory of Laser Technology, Huazhong University of Science and Technology . The test data shows that the zero resistance temperature of the films prepared by the three methods are above 85K. The best results are obtained by RF sputtering on the ZrO_2 substrate with a starting transition temperature of 99K and a zero resistance temperature of 90K , A width of 2K, current density measured at 78K 10 ~ 3-10 ~ 4A / cm ~ 2. X-ray diffraction, scanning electron microscopy and transmission electron microscopy