【摘 要】
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Hitachi Chemical announced on July 17th,it plans to invest Yen 520 million (approximately US$4.9 million) in a new R & D center for photosensitive dry film for
【出 处】
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China Chemical Reporter
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Hitachi Chemical announced on July 17th,it plans to invest Yen 520 million (approximately US$4.9 million) in a new R & D center for photosensitive dry film for printed wiring boards (PWBs) at Suzhou site,Jiangsu province,eastern China.Hitachi Chemical commenced production of the Suzhou plant this May for the the manu-
Hitachi Chemical announced on July 17th, it plans to invest Yen 520 million (approximately US $ 4.9 million) in a new R & D center for photosensitive dry film for printed wiring boards (PWBs) at Suzhou site, Jiangsu province, eastern China. Hitachi Chemical commenced production of the Suzhou plant this May for the the manu-
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