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采用共溅射和多层膜溅射两种不同的溅射方式制备FePt：Ag颗粒膜。MFM和TEM微观结构观测的结果表明：与多层膜溅射制备的FePt：Ag颗粒膜相比,共溅射制备的颗粒膜具有更小的磁畴尺寸和晶粒尺寸,并且其磁畴和晶粒的分布更加均匀。这种微观结构上的区别可解释为共溅射制备的颗粒膜中Ag原子的分布更加具有随机性。对薄膜内部缺陷的研究进一步证实了该解释。
FePt: Ag particles were prepared by two different sputtering methods, co-sputtering and multilayer sputtering. The results of MFM and TEM microstructures show that compared with the FePt: Ag grain films prepared by multilayer film sputtering, the co-sputtered grain films have smaller magnetic domain size and grain size, and the magnetic domains and Grain distribution more uniform. This difference in microstructure can be explained by the more random distribution of Ag atoms in the co-sputtered particle film. The study of the internal defects in the film further confirmed this explanation.