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西德Oriel Optik公司在72年11月慕尼黑电子展览会上展出了一种新型光致抗蚀剂曝光系统,与目前一般的系统不同,这种新型系统以高度准直的直径为75～150mm的光束进行曝光。因此,可得到较大的分辨率。在不接触掩
The new German company Oriel Optik presented a new type of photoresist exposure system at the Munich Electronics Fair in November 72. Unlike the current system, which is based on a highly collimated diameter of 75 to 150 mm Of the light beam exposure. Therefore, a larger resolution can be obtained. Do not touch the cover