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采用直流磁控溅射在316L不锈钢上制备了高质量的Al膜,并利用扫描电镜、X射线衍射仪分别对镀层的形貌和结构及应力进行了分析。结果表明,温度、溅射功率之间的合理配置才能制备致密性高、表面缺陷少的Al膜,较优工艺参数温度为170℃、溅射功率1400 W;温度比溅射功率更容易改善结晶度,当溅射功率高、基体温度低,薄膜趋向非晶态;制备的薄膜应力小,最大约为0.176 GPa,微结构对应力影响大。
High quality Al film was prepared on 316L stainless steel by DC magnetron sputtering. The morphology, structure and stress of the coating were analyzed by scanning electron microscopy and X-ray diffraction. The results show that the reasonable configuration between the temperature and the sputtering power can produce the Al film with high density and less surface defects. The optimal process parameters are temperature 170 ℃ and sputtering power 1400 W; the temperature is easier to improve the crystallization than the sputtering power Degree, when the sputtering power is high, the temperature of the substrate is low and the film tends to be amorphous. The stress of the prepared film is small, the maximum is about 0.176 GPa, and the microstructure has a great influence on the stress.