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前言离子注入技术除了已成功地应用于半导体器件的掺杂和模拟反应堆材料的辐照损伤以外,近年来,其研究和应用范围又扩大到金属材料表面合金化方面。用离子注入方法制成的近表面合金(厚度≤1μm),在不同的工艺条件下,可以呈现高度过饱和固溶体、亚稳态相、非晶态组织和平衡合金等不同的结构形式。离子注入是金属表面合金化的一种多能的和可控的方法,可以用于研究金属合金化过程的微观机理,也可以用于改善金属材料表面的宏观性能,如耐磨损、耐腐蚀性能,兼有基础理论研究和工业应用两
In addition to the successful application of the ion implantation technology to the doping of semiconductor devices and the irradiation damage of simulated reactor materials, the research and application range of the ion implantation technology has been extended to the surface alloying of metal materials in recent years. The near-surface alloy (thickness≤1μm) made by ion implantation can show different superstructures of supersaturated solid solution, metastable phase, amorphous structure and equilibrium alloy under different process conditions. Ion implantation is a versatile and controllable method of metal surface alloying, which can be used to study the microscopic mechanism of metal alloying process. It can also be used to improve the macroscopic properties of the surface of metal materials, such as wear resistance, corrosion resistance Performance, both basic theoretical research and industrial applications two