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提出采用金刚石膜/硅复合材料作为MSGC基板的可行性。采用热丝辅助化学气相沉积(HFCVD)技术和相关退火工艺获得了金刚石膜/硅复合材料,并采用SEM、Raman光谱仪、微电流仪对复合材料的表面状况、结构、I-V和C-F特性进行了表征。结果表明,该复合材料经抛光后表面平整,退火后电阻率达2.9×10~(10)Ω·cm,电容值小且频率变化稳定,均满足MSGC对基板材料的要求,是一种应用前景极其广泛的MSGC衬底材料。
The feasibility of using diamond film / silicon composite as MSGC substrate is proposed. The diamond films / silicon composites were obtained by hot filament assisted chemical vapor deposition (HFCVD) and related annealing processes. The surface morphology, structure, IV and CF properties of the composites were characterized by SEM, Raman spectroscopy and microtorgraphy . The results show that the surface roughness of the composite after polishing is 2.9 × 10 ~ (10) Ω · cm after annealing, the capacitance value is small and the frequency change is stable, which meets the requirements of MSGC on the substrate material, which is a potential application Extremely versatile MSGC substrate material.