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为了提高TiO2薄膜的光催化效率,利用中频交流磁控溅射技术,采用Ti和Ag金属靶制备了Ag/TiO2复合薄膜。利用X射线光电子能谱、X射线衍射和扫描电子显微镜分析了复合薄膜的成分、结构和表面形貌,并研究了其光催化降解性能。结果发现:Ag在厚度较薄时以聚集颗粒形式存在;在Ag膜厚度为15nm时,Ag/TiO2复合薄膜与TiO2薄膜相比其光催化效率可提高2倍;Ag/TiO2复合薄膜对亚甲基蓝的光催化降解效率与复合薄膜的透射率均随Ag膜厚度增加逐渐下降,其原因是Ag膜厚度不断增加,最终完全覆盖TiO2薄膜表面,阻挡了TiO2薄膜与污染物的有效接触,Ag作为光生电子捕获剂的有利影响消失。
In order to improve the photocatalytic efficiency of TiO2 thin films, Ag / TiO2 composite thin films were prepared by the medium frequency AC magnetron sputtering technique using Ti and Ag metal targets. The composition, structure and surface morphology of the composite films were analyzed by X-ray photoelectron spectroscopy, X-ray diffraction and scanning electron microscopy. The photocatalytic degradation properties of the films were also studied. The results show that Ag exists in the form of agglomerated particles when the thickness is thinner; the photocatalytic efficiency of Ag / TiO2 composite thin film can be increased by 2 times compared with that of TiO2 thin film when Ag film thickness is 15nm; The photocatalytic degradation efficiency and the transmittance of the composite films decreased with the increase of the thickness of the Ag film. The reason for this is that the thickness of the Ag film is continuously increased, finally completely covering the surface of the TiO2 film, effectively blocking the effective contact between the TiO2 film and the pollutants, and Ag as a photogenerated electron The beneficial effect of the capture agent disappears.