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A novel process for fabricating high-density and high diffraction efficiency inor- ganic gratings has been proposed by combining laser interference and chemical etching. In the present work, UV photosensitive Zr-contained sol was synthesized, and photosensitive ZrO2/BzAc gel films on (100) silicon were prepared using the sol-gel method. Subsequently, inorganic film gratings with a pitch of 1 μm were fabricated by laser interference in this photosensitive gel film combining with the process of heat treatment. In order to increase the depth-to-width ratio of the grat- ings, chemical etching was adopted by using iodine-saturated KOH as anisotropic etchant, which improved the diffraction efficiency of the gratings effectively. Fur- thermore, the diffraction efficiency was improved by gold coating to enhance the surface glossiness and reflection coefficient.
A novel process for fabricating high-density and high diffraction efficiency in-ganic gratings has been proposed by combining laser interference and chemical etching. In the present work, UV photosensitive Zr-contained sol was synthesized, and photosensitive ZrO2 / BzAc gel films on 100) silicon were prepared using the sol-gel method. Previous order to increase the depth-to- width ratio of the grat- ings, chemical etching was adopted by using iodine-saturated KOH as anisotropic etchant, which improved the diffraction efficiency of the gratings effectively. The diffraction efficiency was improved by gold coating to enhance the surface glossiness and reflection coefficient