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离子注入是在真空中用能量为几十到几百Kev的离子束轰击固体表面,形成不受平衡相图限制的表面合金层(微米数量级)的过程。它是不同于镀层法及扩散法的表面处理方法(图1)。图中R_P是注入离子的平均穿透深度(投影射程),对一定的注入离子、基体材料、注入能量可按LSS理论计算。注入层合金相可以是平衡相、亚稳相或非晶态,依基体材料和注入条件而定。
Ion implantation is the process of bombarding a solid surface with an ion beam of tens to hundreds Kev in vacuum, forming a surface alloy layer (on the order of micrometers) that is not limited by the equilibrium phase diagram. It is different from the plating method and diffusion method of surface treatment (Figure 1). In the figure, R_P is the average penetration depth of the implanted ions (projection range). For certain implanted ions and matrix materials, the injected energy can be calculated according to the LSS theory. The injection layer alloy phase can be either a balanced phase, a metastable phase or an amorphous state, depending on the host material and injection conditions.