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对ＴｉＮｉ合金化学抛光液的组成和抛光工艺进行了研究和优化发现，化学抛光的质量不仅与抛光液配方和抛光工艺直接相关，还与ＴｉＮｉ合金的处理状态有关，冷轧态较固溶及退火态易获得低的表面粗糙度。用电化学方法测试了化学抛光与机械抛光试样的阳极极化曲线，结果表明，化学抛光能提高ＴｉＮｉ合金的点蚀电位（Ｅｂ），降低再钝化电位（Ｅｒｐ），从而显著提高其耐蚀性，使化学抛光的表面达到镜面状态。
The composition and polishing process of TiNi alloy chemical polishing solution were studied and optimized. The quality of chemical polishing is not only directly related to polishing solution formulation and polishing process, but also to the treatment status of TiNi alloy. The cold-rolled state is more solution and annealed State easy access to low surface roughness. The results of electrochemical polishing showed that the chemical polishing can improve the pitting potential (Eb) of TiNi alloy and decrease the reactivation potential (Erp), thus improving the resistance of TiNi alloy Etchability, so that the chemical polishing surface to the mirror state.