【摘 要】
:
In this paper,we describe the saturation effect of a silicon germanium (SiGe) heterojunction bipolar transistor (HBT) fabricated on a thin silicon-on-insulator
【机 构】
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Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices,School
【出 处】
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Chinese Physics B
论文部分内容阅读
In this paper,we describe the saturation effect of a silicon germanium (SiGe) heterojunction bipolar transistor (HBT) fabricated on a thin silicon-on-insulator (SOI) with a step-by-step derivation of the model formulation.The collector injection width,the internal base-collector bias,and the hole density at the base-collector junction interface are analysed by considering the unique features of the internal and the external parts of the collector,as they are different from those of a bulk counterpart.
In this paper, we describe the saturation effect of a silicon germanium (SiGe) heterojunction bipolar transistor (SOI) with a step-by-step derivation of the model formulation. The collector injection width, the internal base-collector bias, and the hole density at the base-collector junction interface are analysed by considering the unique features of the internal and the external parts of the collector, as they are from from of a bulk counterpart.
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