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分别在未施加偏压和施加-100 V偏压条件下,利用磁控溅射技术在压气机叶片用1Cr11Ni2W2MoV热强不锈钢基体上沉积了Ti_(0.3)Al_(0.7)N和Ti_(0.39)Al_(0.55)Si_(0.05)Y_(0.01)N硬质涂层.实验结果表明,施加偏压及Si和Y掺杂明显改变了涂层的相结构,提高了涂层致密度,施加-100 V偏压且添加Si和Y的涂层为非晶结构,表面更加均匀致密.950℃氧化实验表明:Ti_(0.39)Al_(0.55)Si_(0.05)Y_(0.01)N涂层表面形成极薄且致密的Al_2O_3保护性氧化膜,大大降低了氧化速率.施加-100 V偏压的(Ti,Al)N和(Ti,Al,Si,Y)N沉积态涂层与未施加偏压的相应涂层相比,硬度均降低,尤其是(Ti,Al,Si,Y)N涂层变化显著.经950℃热处理,施加偏压的(Ti,Al,Si,Y)N涂层硬度略有降低,这是由于形成了硬度较低的B4相,而未施加偏压的(Ti,Al,Si,Y)N涂层硬度显著提高,这归因于B1相固溶体的分解.划痕测试结果表明,在实验载荷(50N)下,所有涂层均未出现连续性的剥落.
Ti0.3Al0.7N and Ti0.39Al_3 were deposited on the 1Cr11Ni2W2MoV hot-dip stainless steel substrate by magnetron sputtering technique under the bias voltage of -100V and bias voltage of -100V respectively. (0.55) Si_ (0.05) Y_ (0.01) N hard coatings.The experimental results show that the application of bias voltage and Si and Y doping significantly change the phase structure of the coating, improve the coating density, the application of -100 V The coatings with bias and addition of Si and Y were amorphous and the surface was more uniform and compact.The oxidation experiments at 950 ℃ showed that the surface of Ti_ (0.39) Al_ (0.55) Si_ (0.05) Y_ (0.01) The dense Al 2 O 3 protective oxide film greatly reduces the oxidation rate.The (Ti, Al) N and (Ti, Al, Si, Y) N deposited coatings with -100 V bias applied with the corresponding coatings without bias The hardness of (Ti, Al, Si, Y) N coating decreased slightly when compared with that of (Ti, Al, Si, Y) N coatings treated with 950 ℃ heat treatment , Due to the formation of the lower hardness B4 phase, while the unbiased (Ti, Al, Si, Y) N coating significantly increased in hardness due to the decomposition of the B1 phase solid solution. The scratch test results Under the experimental load (50N), all the coatings did not appear continuous Flaking.