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提出了一种研究湿法腐蚀进程的新方法———红外热像法。在湿法腐蚀中,金属或半导体基片浸泡在化学试剂中,由于化学能的作用,会在溶剂中产生热能,从而发出红外辐射,利用红外热像仪,将探测到的红外辐射信号送至计算机进行处理,得到热像图,从而可以对湿法腐蚀的进程进行分析。理论分析和实验结果都表明,红外热像法可以直观地观测到湿法腐蚀时显著的热扩散过程,从而对湿法腐蚀进程的监测、控制具有指导意义,同时也是红外技术应用的扩展。
A new method to study the wet etching process is proposed - infrared thermography. In wet etching, a metal or semiconductor substrate is immersed in a chemical agent, and as a result of chemical energy, heat energy is generated in the solvent to emit infrared radiation, and the infrared radiation signal detected by the infrared thermal imager is sent to Computer processing, thermography, which can be wet etching process analysis. Theoretical analysis and experimental results show that the infrared thermal imaging method can intuitively observe the significant thermal diffusion during wet etching, which is of guiding significance for the monitoring and control of the wet etching process. It is also an extension of the application of infrared technology.