论文部分内容阅读
集成电路用正性光刻胶是大规模集成电路中的关键工艺材料,也是目前国际上领先的微电子材料,过去仅有日本、韩国等少数国家能够生产,我国全部依赖进口。上世纪90年代初,集成电路用正性光刻胶被列为电子信息材料范畴中的首位新材料, 成为国家“863”重点科技攻关项目,担纲者是苏州瑞红电子化学品有限公司,已成功研发出集成电路用正性光刻胶,并迅速实现产业化。产品具有超高感度、高粘附性以及工艺宽容度大等显著特点。目前,瑞红公司已成为我国微电子化学材料最大规模的专业生产单位,也是国内唯一能同时生产集成电路用光刻胶、液晶显示用光刻胶2种重点产品的企业。瑞红公司产品能保持国际领先水平,主要得益于公司的技术创新机制,一方面依托自身的技术创新平台,另方面加大与国内高校院所的联合。为保证年年有新品问世,公司构建了基础稳、目标高的金字塔式技术创新模式,以拳头产品集成电路用光刻胶为基础,先后自主开发了
Positive photoresists for integrated circuits are the key process materials in large scale integrated circuits and the leading microelectronic materials in the world. In the past, only a few countries such as Japan and South Korea were able to produce them, and all of China relied on imports. In the early 90s of last century, positive photoresists for integrated circuits were listed as the first new material in the field of electronic information materials and became the key “863” key scientific and technological project under the auspices of Suzhou Ruihong Electronic Chemicals Co., Ltd. Successfully developed a positive photoresist integrated circuits, and rapid industrialization. Products with high sensitivity, high adhesion and process tolerance and other significant features. At present, Ruihong has become the largest professional manufacturer of microelectronic chemical materials in China, and also the only enterprise in China that can simultaneously produce two key products of photoresists for integrated circuits and photoresists for liquid crystal displays. Ruihong products to maintain the leading international level, mainly due to the company’s technology innovation mechanism, on the one hand, relying on its own platform for technological innovation, on the other hand increase the joint with the domestic institutions of higher learning. In order to ensure the advent of new products every year, the company built a pyramid-based technological innovation model with steady foundation and high target. Based on the photoresist of the fist-product integrated circuit, the company independently developed