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在半导体工业中,大约75%的生产用的光刻掩模是采用高分辨率光刻版。高分辨率掩模成本低的优点抵销了它相对于硬表面掩模(铬以及氧化铁等)来说成品率低和寿命短之不足。不断地研究出提高光刻掩模的成品率和降低成本的方法。本文介绍了乳胶掩模工艺以及干燥枝术方法和设备的目前情况。工艺和干燥是提高掩模成品率的最重要方面。
In the semiconductor industry, about 75% of the lithography masks used in production are high resolution lithographic plates. The low cost of a high resolution mask offsets its low yield and short life relative to hard surface masks (chromium and iron oxide, etc.). The methods of increasing the yield of the lithography mask and reducing the cost are continuously researched. This article describes the current situation of latex mask processes and methods and equipment for dry sticking. Process and drying are the most important aspects of improving mask yield.