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利用磁过滤真空阴极电弧技术制备了sp~3键大于80%的四面体非晶碳(ta-C)薄膜,通过冷阴极离子源产生keV能量的氩离子轰击ta-C薄膜,研究了氩离子轰击能量对ta-C薄膜结构,内应力以及耐磨性的影响.通过X射线光电子能谱和原子力显微镜研究了氩离子轰击对薄膜结构与表面形貌的改性,研究表明,氩离子轰击诱导了ta-C薄膜中sp~3键向sp~2键的转化,并且随着氩离子轰击能量的增大,薄膜中sp~2键的含量逐渐增多,薄膜内应力随着氩离子轰击能量的增大逐渐减小.氩离子轰击对薄膜的表面形貌有较大影响,在薄膜表面形成刻蚀坑,并且改变了薄膜的表面粗糙度,随着氩离子轰击能量的增大,薄膜的表面粗糙度也会逐渐增大.通过摩擦磨损仪的测试结果,氩离子轰击对薄膜的初始摩擦系数影响较大,但是对薄膜的稳定摩擦系数影响较小,经过氩离子轰击前后的ta-C薄膜的摩擦系数为0.1左右,并且具有优异的耐磨性.
The tetrahedron amorphous carbon (ta-C) thin film with sp ~ 3 bond greater than 80% was prepared by vacuum filtration cathodic arc technique. The ta-C thin film was fabricated by argon ion bombardment of keV energy by cold cathode ion source. Effects of bombardment energy on the structure, internal stress and wear resistance of ta-C thin filmsThe effects of argon ion bombardment on the structure and surface morphology of the films were studied by X-ray photoelectron spectroscopy and atomic force microscopy. The results show that argon ion bombardment induced The sp ~ 3 bond to sp ~ 2 bond in ta-C film was transformed, and with the increase of argon ion bombardment energy, the content of sp ~ 2 bond in the film increased gradually. The internal stress of film changed with the energy of argon ion bombardment Argon ion bombardment on the surface morphology of the film have a greater impact on the surface of the film to form etch pits, and change the surface roughness of the film, with the argon ion bombardment energy increases, the surface of the film The roughness will increase gradually.According to the test results of friction and wear tester, argon ion bombardment has a great influence on the initial friction coefficient of the film, but it has little effect on the stable friction coefficient of the film. The ta-C film before and after argon ion bombardment The coefficient of friction is 0.1 left And has excellent abrasion resistance.