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利用金属有机物化学气相沉积(MOCVD)方法在Al2O3(0001)衬底上生长ZnO薄膜,通过改变衬底温度及生长舱压力,得到了各种不同表面形貌的ZnO薄膜。扫描电镜(SEM)用来对样品的形貌进行观察,当衬底温度及生长舱压力分别为400℃,40Pa和450℃,8Pa时,得到了纳米管及纳米墙结构。利用X射线衍射谱(XRD)、透射光谱及光致发光谱对样品的结构及光学性能进行评价。实验结果证明对于较高的生长温度和较低的生长舱压力所生长的样品具有较好的结晶质量。
ZnO films were grown on Al2O3 (0001) substrate by metal organic chemical vapor deposition (MOCVD), and ZnO films with different surface morphologies were obtained by changing substrate temperature and cell pressure. Scanning electron microscopy (SEM) was used to observe the morphology of the samples. The nanotubes and nanowall structures were obtained when the substrate temperature and chamber pressure were 400 ℃, 40Pa and 450 ℃ respectively. The structure and optical properties of the samples were evaluated by X-ray diffraction (XRD), transmission and photoluminescence spectra. The experimental results show that the samples grown on the higher growth temperature and the lower growth chamber pressure have better crystalline quality.