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1999年亚洲地区化学气相淀积国际学术会议(1999 Asian Conference on Chemical Va-por Deposition,简称1999亚洲CVD会议或Asian CVD 99)成功地于1999年5月10～13日在上海举办。来自全世界不同国家和地区的81位代表在良好的学术气氛中进行了交流,并且促进了国际合作,同时扩大了我国在国际学术界的影响。化学气相淀积(Chemical Vapor Deposition,简称CVD)是应用面很广泛的一种实用技
The 1999 Asian Conference on Chemical Va-por Deposition (1999 Asian CVD Conference or Asian CVD 99) was successfully held in Shanghai from May 10 to May 1999. The 81 delegates from different countries and regions in the world conducted exchanges in a good academic atmosphere and promoted international cooperation while expanding our influence in the international academic community. Chemical Vapor Deposition (CVD) is a practical application of a wide range of applications