论文部分内容阅读
采用全息光刻和二次显影的方法制备了柱形二维光子晶体.在此过程中,二维点状的周期结构首先在正性光刻胶上直接形成,然后经由Si3N4硬掩模转移到衬底材料上.利用二次显影的方法,曝光强度最强和曝光强度中等区域的光刻胶能够被同时充分显影,而曝光强度最弱区域的光刻胶则可以完全被保留下来.通过调节入射角,可以方便地调节二维结构的周期.利用此方法,在相对较大的面积上制备了不同周期的二维结构,二维结构具有很好的均匀性和重复性.文章对有关的工艺参数进行了详细讨论.
A two-dimensional cylindrical photonic crystal is prepared by holographic lithography and secondary development, in which a two-dimensional point-like periodic structure is first formed directly on a positive photoresist and then transferred through a Si3N4 hard mask to Substrate material by using the method of secondary development, the strongest exposure intensity and the middle of the exposure intensity of the photoresist can be fully developed at the same time, and the exposure intensity of the weakest area of the photoresist can be completely retained by adjusting Angle of incidence can be easily adjusted two-dimensional structure of the cycle.This method, in a relatively large area prepared two-dimensional structure of different periods, two-dimensional structure has good uniformity and repeatability of the article on the relevant Process parameters were discussed in detail.