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不同沉积条件下,在单晶硅基底上沉积了含氮氟化类金刚石(FN-DLC)薄膜,用静滴接触角/表面张力测量仪测量了水与FN-DLC膜表面的接触角.用X射线光电子能谱、Raman光谱和傅里叶变换吸收红外光谱(FTIR)分析了薄膜的组分和结构.用原子力显微镜观测了薄膜的表面形貌.结果表明,FN-DLC薄膜疏水性能主要取决于薄膜表面的化学结构、薄膜表面极化强度的强弱、以及薄膜的表面粗糙度的大小.sp3/sp2的比值减小,CF2基团含量增加,薄膜粗糙度增加,接触角增大;反之,则接触角减小.在工艺上,沉积温度和功率的减小,气体流量比r(r=CF4/[CF4+CH4])的增加,都会使水的浸润性变差,接触角增大.
Under different deposition conditions, a thin film of nitrogen-containing fluorinated diamond (FN-DLC) was deposited on a monocrystalline silicon substrate and the contact angle between water and the surface of the FN-DLC film was measured using an IV contact angle / surface tension meter. X-ray photoelectron spectroscopy, Raman spectroscopy and Fourier transform infrared spectroscopy (FTIR) were used to analyze the composition and structure of the films. The surface morphology of the films was observed by atomic force microscopy. The results show that the hydrophobic properties of FN-DLC films mainly depend on The chemical structure of the surface of the film, the strength of the polarization on the surface of the film and the surface roughness of the film, the ratio of sp3 / sp2 is decreased, the content of CF2 group is increased, the roughness of the film is increased, and the contact angle is increased; , The contact angle is reduced.In the process, the decrease of deposition temperature and power, the increase of the gas flow rate r (r = CF4 / [CF4 + CH4]) will worsen the wettability of water and increase the contact angle .