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利用电子回旋共振微波放电氮等离子体对单晶硅表面进行了低温大面积氮化的探索 ,通过样品表征和等离子体成分探测 ,分析讨论了氮化机理。结果表明 ,这种方法可以用于硅表面的低温氮化处理 ,获得大面积的均匀氮化硅表层。
The use of electron cyclotron resonance microwave discharge nitrogen plasma on the silicon surface of a large area of low-temperature nitride exploration, through the sample characterization and plasma composition detection, analysis and discussion of the nitriding mechanism. The results show that this method can be used for low temperature nitriding of silicon surface to obtain a large area of uniform silicon nitride surface layer.