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脉冲激光沉积(PLD)技术制备类金刚石(DLC)薄膜存在着金刚石相含量较低、石墨颗粒多、薄膜与衬底附着力差、膜内应力大等技术难题,为此,研究人员研究出了多种技术措施,如通过引入背景气体、超快激光、偏压、磁场以及加热等措施提高了薄膜金刚石相含量;采用金刚石或丙酮靶材、减小单脉冲能量等措施减少了石墨颗粒;采用间歇沉积、真空退火、超快激光等措施减少了膜内应力;合理设计过渡层改善了膜与衬底间的附着力等。这些技术有力地推动了脉冲激光沉积技术的发展。
Pulsed laser deposition (PLD) technology for preparing diamond-like carbon (DLC) films has the technical problems of low diamond content, many graphite particles, poor adhesion between the film and the substrate and large stress in the film. Therefore, A variety of technical measures, such as the introduction of background gas, ultrafast laser, bias, magnetic field and heating measures to improve the film diamond phase content; the use of diamond or acetone target, to reduce the single pulse energy and other measures to reduce the graphite particles; Intermittent deposition, vacuum annealing, ultra-fast laser and other measures to reduce the film stress; rational design of the transition layer to improve the adhesion between the film and the substrate. These technologies have effectively promoted the development of pulsed laser deposition technology.