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在石英钟罩式微波等离子体化学气相沉积实验装置中研究了基片位置对金刚石薄膜沉积质量的影响。扫描电子显微镜显微形貌观察和激光喇曼谱分析表明 ,对微波等离子体化学气相沉积制备金刚石薄膜而言 ,基片位置处于近等离子体球下游区域将有利于改善金刚石薄膜沉积质量。
The effect of substrate location on the deposition quality of diamond films was investigated in a quartz bell jar microwave plasma chemical vapor deposition apparatus. Scanning electron microscopy and laser Raman spectrum analysis show that for the plasma CVD CVD of diamond films, the substrate location near the plasma ball downstream of the region will help to improve the quality of diamond film deposition.