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【目的】了解磁性固位的下颌种植覆盖义齿的应力状况及其分布规律 ,为磁性固位体的临床应用提供生物力学依据。【方法】采用二维光弹应力分析法 ,分析圆柱形种植体在垂直向和侧向加载条件下种植体—骨界面的应力状况。【结果】种植体应力主要为均匀分布的压应力 ,最大应力位于种植体根尖部 ,颈部应力相对较小 ,未见明显弯曲应力。【结论】磁性固位种植义齿的种植体应力分布符合生物力学要求 ,有利于种植体的长期成功
【Objective】 To understand the stress state and distribution of mandibular implant overdenture with magnetic retention and provide biomechanical basis for the clinical application of magnetic retention. 【Method】 The two-dimensional photoelastic stress analysis method was used to analyze the stress state of implant-bone interface under vertical and lateral loading. 【Result】 The stress of the implant was mainly compressive stress with uniform distribution. The maximum stress was located at the apical part of the implant. The stress on the neck was relatively small with no obvious bending stress. 【Conclusion】 The stress distribution of implants with magnetic retention implants conforms to biomechanical requirements and is beneficial to the long-term success of implants