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为了研究一种新型的光电二极管,用于激光打钯,测量钯打出的低能X射线,急需Ni材阳极网,要求技术规格如下: 当前,国内制造网的办法有编织、电火花切割、制模具后冲压制网,还有照相电镀、照相腐蚀制网。由于此种光电二极管阴极与阳极距离仅为1.2毫米,编织网有毛刺,网面不在一平面上,不能采用。再有此阳极网线宽仅为0.03毫米、网厚为0.03毫米,电火花加工与模具冲压也难实现。照相电镀网由于镀的镍金属
In order to study a new type of photodiode, which is used to laser-beat palladium and measure the low-energy X-rays emitted by palladium, Ni anode anode network is urgently needed. The technical specifications are as follows: Currently, domestic manufacturing methods include braiding, EDM, After stamping system network, as well as photographic plating, corrosion network camera system. As the distance between the cathode of this photodiode and the anode is only 1.2 mm, the braid has a burr, the mesh is not in a plane and can not be used. Then this anode network line width of only 0.03 mm, 0.03 mm thickness, EDM and die stamping is difficult to achieve. Photographic plating mesh due to plated nickel metal