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采用俄罗斯UVN 0.5D2I离子束辅助电弧离子镀沉积设备,在高速钢W18Cr4V基材上沉积TiN膜层。研究了N离子束轰击能量对膜层表面形貌、相结构、显微硬度的影响。结果表明:N离子束辅助轰击,能够有效地减少和降低膜层表面“大颗粒”的数量和尺寸,消除了膜层中较软Ti2N相,得到了单一的TiN相。随着轰击能量的增加,TiN相结构不发生改变,TiN(111)取向逐渐减弱,而(200)取向逐渐增强。N离子束辅助轰击能量的增加,提高了膜层的显微硬度。
Russia UVN 0.5D2I ion beam assisted arc ion plating deposition equipment, high-speed steel W18Cr4V substrate deposited TiN film. The effect of N ion beam bombardment energy on the surface morphology, phase structure and microhardness of the film was studied. The results show that N - ion beam assisted bombardment can effectively reduce and decrease the number and size of large particles on the surface of the film, eliminate the softer Ti2N phase in the film and get a single TiN phase. With the increase of bombardment energy, the structure of TiN does not change, the orientation of TiN (111) decreases gradually, and the orientation of (200) increases gradually. N ion beam assisted bombardment energy increase, improve the film’s microhardness.