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用电阻测量、X 光衍射和 DTA、DSC 技术,研究了在低于玻璃化温度 Tg 的真空退火对 Cu_(50)Zr_(50)、Cu_(55)Zr_(45)、Cu_(60)Zr_(40)非晶合金抗氧化性能的影响。研究表明,真空退火中形成的极薄的优质的 ZrO_2覆盖膜能有效阻挡氧化,大大提高上述非晶合金在晶化前和晶化后的抗氧化能力;在更高温度,由于 ZrO_2膜的破裂和脱落,使其抗氧化能力丧失,但是破碎的 ZrO_2膜仍然对这时的氧化有重要作用。
The effects of vacuum annealing on Cu 50 Zr 50, Cu 55 Zr 45, Cu 60 Zr 2 O 4 and Cu 60 Zr 2 O 4 were studied by means of resistance measurement, X-ray diffraction, DTA and DSC. 40) amorphous alloy oxidation resistance. The results show that the ultra-thin, high-quality ZrO 2 coating formed in vacuum annealing can effectively block the oxidation and greatly improve the oxidation resistance of the above amorphous alloy before and after crystallization. At higher temperatures, due to the rupture of the ZrO 2 film, And shedding, so that its antioxidant capacity loss, but the broken ZrO 2 film is still the oxidation of the time have an important role.