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改变CHF3 CH4源气体流量比 ,使用微波电子回旋共振化学气相沉积方法 (ECR CVD)制备了具有不同C—F键结构的a C :F :H薄膜 ,着重研究了退火对其结构的影响 .结果显示薄膜的厚度及其光学带隙E0 4随退火温度的上升均呈现了不同程度的下降 .借助于红外吸收光谱和所提出的热解模型解释了产生这种关系的结构上的根源 .
The CHF3 CH4 source gas flow ratio was changed and a C: F: H thin films with different C-F bond structures were prepared by microwave electron cyclotron resonance chemical vapor deposition (ECR CVD), focusing on the effect of annealing on their structure. Results The thickness and optical band gap E0 4 of the films are both decreased with the increase of annealing temperature.The structural origin of this relationship is explained by means of infrared absorption spectroscopy and the proposed pyrolysis model.