Biomimetic Moth-eye Anti-reflective Poly-(methyl methacrylate) Nanostructural Coating

• 作 者: Hongbo Xu Liuting Gong Shoucai Zhang Renping Ma Lei Pan Jiupeng Zhao Yao Li
• 机 构: MIIT Key Laboratory of Critical Materials Technology for New Energy Conversion and Storage, School o
• 出 处: 仿生工程学报（英文版）
• 发表日期: 2019年6期
• 关键词: nanoimprinting sub-wavelength structure antireflective biomimetic moth-eye

This study reports a simple imprinting method for the fabrication of biomimetic moth-eye antireflective polymethyl methacrylate (PMMA) nanostructures on the surface of the substrate.The antireflection structured silicon was obtained by Reactive Ion Etching (RIE) method.By using the antireflection structured silicon substrate as the imprinting stamp,the biomimetic moth-eye polymer structures showed tapered holes,whose depth and periodicity were around 780 nm and 580 nm,respectively.The reflectance of the resulting PMMA structures was reduced from 10％ to less than 1％ in the wavelength range from 300 nm to 1600 nm.This simple methodology can be scaled up via self-loading and nanoimprinting,which may have a promising application in optoelectronic devices and solar cells.