Structural and mechanical properties of amorphous carbon films deposited by the dual plasma techniqu

• 作 者: Yaohui Wang Xu Zhang Xianying
• 机 构: KeyLaboratoryoftheMinistryofEducationofChinaforBeamTechnologyandMaterialModification,BeijingRadiatio
• 出 处: 北京科技大学学报：英文版
• 发表日期: 2008年5期
• 关键词: 金属材料 无定形碳 乙炔 薄膜 metal containing amorphous carbon amorphous carbon films filtere

Direct current metal filtered cathodic vacuum arc (FCVA) and acetylene gas (C2H2) were wielded to synthesize Ti-containing amorphous carbon films on Si (100). The influence of substrate bias voltage and acetylene gas on the microstructure and mechanical p