论文部分内容阅读
NA1.35浸没式光刻照明系统是超大规模集成电路的核心设备,为了实现从Ar F激光器发出的光束经过一系列模块传输后到达掩模面的能量满足光刻曝光系统的要求,需要在系统中引入非球面透镜,以减少镜片数量,提高能量利用率。为解决现在非球面透镜具有的加工难度和控制精度不足的缺陷,设计出一种优化控制保证非球面加工和检测的方法。在光学系统设计中优化非球面的形状,保证非球面度,满足非球面变化率在可加工和检测的范围内,并控制非球面拐点的产生。照明系统中镜片数量最多的模块是耦合镜组,通过非球面的优化,镜片数量从12片减少到9片,系统能量利用率提高近25%。此外,提高了系统像质NA一致性,像方远心度,弥散斑直径和畸变,满足了曝光光学系统对掩模面的能量要求,故该非球面控制技术具有良好的可加工性和可检测性。
NA1.35 immersion lithography lighting system is the core equipment of VLSI. In order to meet the requirements of lithography exposure system in order to achieve the energy reaching the mask surface after the beam from ArF laser is transmitted through a series of modules, In the introduction of aspherical lens, to reduce the number of lenses, improve energy efficiency. In order to solve the defect that the aspheric lens possesses the difficulty of processing and the control precision is insufficient, a method of optimizing control to ensure aspheric processing and testing is designed. Optimize the shape of the aspherical surface in the optical system design, ensure the asphericity, meet the aspheric surface change rate in the machinable and detectable range, and control the aspheric inflection point. The module with the largest number of lenses in the lighting system is the coupling lens group. By optimizing the asphericity, the number of lenses is reduced from 12 to 9, and the system energy utilization rate is increased by nearly 25%. In addition, the system has the same image quality and NA consistency, such as telecentricity, diffusion spot diameter and distortion, to meet the exposure optical system on the mask surface energy requirements, so the aspherical control technology has good machinability and can Testability.