Method to remove wafer surface particles

来源 :Journal of Semiconductors | 被引量 : 0次 | 上传用户:galagala
下载到本地 , 更方便阅读
声明 : 本文档内容版权归属内容提供方 , 如果您对本文有版权争议 , 可与客服联系进行内容授权或下架
论文部分内容阅读
A big yield drop has been observed during the automatic inspection(AOI) after the saw stage. A step by step AOI inspection check and defect review is made to see which step made a big yield drop and which kind of defect contributed most to the yield drop. Scanning electron microscope(SEM) and energy dispersive spectrometer(EDS) analysis showed the shape and chemical element of the particle. From the EDS result, particles can be separated into two categories. One was the inorganic related materials, mainly including silicon(Si) element, which came from the saw stage. A design of experiment(DOE) is used to find some reasonable saw relative parameter and optimize it in order to remove the particle from the saw stage. But the quantity of this kind of particle was small. Yield was only improved by less than 5%. Our main effort was to remove another kind of particle which was organic related materials, mainly including carbon(C) and oxygen(O) element. This kind of particle was from tape residue. In order to remove the tape residual, one step was added before the saw stage. Almost all of the tape residual was removed. Finally, the final yield was improved by more than 15%. A big yield drop has been observed during the automatic inspection (AOI) after the saw stage. A step by step AOI inspection check and defect review is made to see which step made a big yield drop and which kind of defect contributed most to the yield drop. Scanning electron microscope (SEM) and energy dispersive spectrometer (EDS) analysis showed the shape and chemical element of the particle. From the EDS result, particles can be separated into two categories. One was the inorganic related materials, mainly including silicon Si) element, which came from the saw stage. A design of experiment (DOE) is used to find some reasonable saw relative parameter and optimize it in order to remove the particle from the saw stage. But the quantity of this kind of particle was small. Yield was only improved by less than 5%. Our main effort was to remove another kind of particle which was organic related materials, mainly including carbon (C) and oxygen (O) element. This kind of particle was from tape resi Due. In order to remove the tape residual, one step was added before the saw stage. Finally, the final yield was improved by more than 15%.
其他文献
前行有声,岁月无言。1947年5月,曙光从乌兰浩特洮儿河畔升起,号角声声穿过岁月的风云,步履铿锵踏出草原儿女辉煌的征程。成就有声,奋斗无言。蓬勃崛起的内蒙古自治区,载着一
第一条为科学合理地对地质斟查资质进行分类分级,根据(国务院令第520号)的有关规定,制定本标准.rn第二条斟查技术人员主要包括高、中级斟查技术人员的专业和数量.
A calculation of film surface temperature during thin films growth by sputtering technique is proposed.The calculation procedure is based on the conversion into
期刊
We represent a design of a 20 W, fiber-coupled diode laser module based on 26 single emitters at 520 nm.The module can produce more than 20 W output power from
期刊
The addition of Cu nanoparticles into the solder pastes by mechanical mixing method creates a positive effect on the microstructure refinement of the LED solder
期刊
随着教育领域中“互联网+教育”改革的开展,对教师的专业素养提出了新的要求,这就要求教师的专业发展根据教育改革的大背景做出相应的改变。而小学教育阶段在教育领域中的基