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采用反应溅射法制备了ＴｉＮ／ＡｌＮ 纳米多层膜， 并通过ＸＲＤ， ＨＲＥＭ 和显微硬度计对多层膜的调制结构和力学性能进行了研究。结果表明： ＴｉＮ／ＡｌＮ 纳米多层膜有较好的调制结构。小调制周期时， ＡｌＮ 调制层以ＦＣＣ 结构在ＴｉＮ 调制层上外延生长。调制周期增大，ＡｌＮ 调制层中出现六方晶型。ＴｉＮ／ＡｌＮ 的显微硬度随调制周期的减小单调上升， 并在调制周期＝ ２ｎｍ 时达到最高值ＨＫ３２９３。硬度的增高极有可能是小调制周期时立方ＡｌＮ 的形成所致
The TiN / AlN multilayered films were prepared by reactive sputtering. The structure and mechanical properties of the multilayered films were investigated by XRD, HREM and microhardness tester. The results show that: TiN / AlN nano-multilayer film has a better modulation structure. During the small modulation period, the AlN modulation layer is epitaxially grown on the TiN modulation layer with the FCC structure. The modulation period increases and the hexagonal crystal appears in the AlN modulation layer. The microhardness of TiN / AlN monotonically increases with the decreasing of the modulation period and reaches the highest value of HK3293 at the modulation period of = 2 nm. The increase in hardness is most likely due to the formation of cubic AlN during the small modulation period