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用微波电子回旋共振（ＥＣＲ）等离子体溅射法在常温下制备出优质的ＴｉＮ薄膜．采用静电探针技术，对ＥＣＲ等离子体进行了诊断，研究了等离子体参数与装置运行参数之间的关系，探讨了等离子体参数对成膜工艺过程的影响．
High quality TiN films were prepared at room temperature by microwave electron cyclotron resonance (ECR) plasma sputtering. Electrostatic probe technique was used to diagnose ECR plasma. The relationship between plasma parameters and device operating parameters was studied. The influence of plasma parameters on the film forming process was also discussed.