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研究了射频溅射制备的NiOx 膜的电致变色性能 ,发现富氧非理想化学配比的NiOx(x >1)膜具有变色活性 ,这种膜出现Ni3 + 和Ni2 + 的混合价态 ,当H+ 注入并占据Ni空位时 ,导致Ni3 + 的t2g能级被填满 ,Ni3 + 被阴极还原为Ni2 + 引起光学透明 ,即为漂白态 ;反之 ,H+ 被萃取出NiOx 膜 ,导致Ni2 + 的t2g能级出现空穴 ,Ni2 + 被氧化为Ni3 + 引起光吸收 ,则为着色态 .
The electrochromic properties of NiOx films prepared by RF sputtering were investigated. It was found that the NiOx (x> 1) films with non-ideal ratio of oxygen enrichment had discoloration activity. The mixed valence of Ni3 + and Ni2 + When H + is implanted and occupied by Ni vacancies, the t2g level of Ni3 + is filled, and the Ni3 + is cathodically reduced to Ni2 +, resulting in optical transparency. That is to say, H + is extracted from the NiOx film, resulting in t2g Holes appear at the energy level, and Ni2 + is oxidized to Ni3 + to cause light absorption, which is a colored state.